Digital Holography for MEMS and Microsystem Metrology

For the promotion of global trading and the reduction of potential risks, the role of international standardization of nanotechnologies has become more and more important. This book gives an overview of the current status of nanotechnology including the importance of metrology and characterization at the nanoscale, international standardization of nanotechnology, and industrial innovation of nano-enabled products. First the field of nanometrology, nanomaterial standardization and nanomaterial innovation is introduced. Second, major concepts in analytical measurements are given in order to provide a basis for the reliable and reproducible characterization of nanomaterials. The role of standards organizations are presented and finally, an overview of risk management and the commercial impact of metrology and standardization for industrial innovations.

This book presents a substantial description of the principles and applications of digital holography. The first part of the book deals with mathematical basics and the linear filtering theory necessary to approach the topic. The next part describes the fundamentals of diffraction theory and exhaustively details the numerical computation of diffracted fields using FFT algorithms. A thorough presentation of the principles of holography and digital holography, including digital color holography, is proposed in the third part. A special section is devoted to the algorithms and methods for the numerical reconstruction of holograms. There is also a chapter devoted to digital holographic interferometry with applications in holographic microscopy, quantitative phase contrast imaging, multidimensional deformation investigations, surface shape measurements, fluid mechanics, refractive index investigations, synthetic aperture imaging and information encrypting. Keys so as to understand the differences between digital holography and speckle interferometry and examples of software for hologram reconstructions are also treated in brief. Contents 1. Mathematical Prerequisites. 2. The Scalar Theory of Diffraction. 3. Calculating Diffraction by Fast Fourier Transform. 4. Fundamentals of Holography. 5. Digital Off-Axis Fresnel Holography. 6. Reconstructing Wavefronts Propagated through an Optical System. 7. Digital Holographic Interferometry and Its Applications. Appendix. Examples of Digital Hologram Reconstruction Programs

This edition of 'CMOS-MEMS' was originally published in the successful series 'Advanced Micro & Nanosystems'. A close look at enabling technologies is taken, the first section on MEMS featuring an introduction to the challenges and benefi ts of three-dimensional silicon processing. An insider's view of industrial MEMS commercialization is followed by chapters on capacitive interfaces for MEMS, packaging issues of micro- and nanosystems, MEMS contributions to high frequency integrated resonators and filters, and the uses of MEMS in mass data storage and electrochemical imaging by means of scanning micro- and nanoprobes. The second section on nanodevices first tackles the emerging topic of nanofluidics with a contribution each on simulation tools and on devices and uses, followed by another two on nanosensors featuring CNT sensors and CMOS-based DNA sensor arrays, respectively.

A state of the art presentation of important advances in the field of digital holography, detailing advances related to fundamentals of digital holography, in-line holography applied to fluid mechanics, digital color holography, digital holographic microscopy, infrared holography, special techniques in full field vibrometry and inverse problems in digital holography

Microelectromechanical systems (MEMS) refer to a collection of micro-sensors and actuators, which can react to environmental change under micro- circuit control. The integration of MEMS into traditional Radio Frequency (RF) circuits has resulted in systems with superior performance levels and lower manufacturing costs. The incorporation of MEMS based fabrication technologies into micro and millimeter wave systems offers viable routes to ICs with MEMS actuators, antennas, switches and transmission lines. The resultant systems operate with an increased bandwidth and increased radiation efficiency and have considerable scope for implementation within the expanding area of wireless personal communication devices. This text provides leading edge coverage of this increasingly important area and highlights the overlapping information requirements of the RF and MEMS research and development communities. * Provides an introduction to micromachining techniques and their use in the fabrication of micro switches, capacitors and inductors * Includes coverage of MEMS devices for wireless and Bluetooth enabled systems Essential reading for RF Circuit design practitioners and researchers requiring an introduction to MEMS technologies, as well as practitioners and researchers in MEMS and silicon technology requiring an introduction to RF circuit design.

Most of the software measures currently proposed to the industry bring few real benefits to either software managers or developers. This book looks at the classical metrology concepts from science and engineering, using them as criteria to propose an approach to analyze the design of current software measures and then design new software measures (illustrated with the design of a software measure that has been adopted as an ISO measurement standard). The book includes several case studies analyzing strengths and weaknesses of some of the software measures most often quoted. It is meant for software quality specialists and process improvement analysts and managers.

Most of the software measures currently proposed to the industry bring few real benefits to either software managers or developers. This book looks at the classical metrology concepts from science and engineering, using them as criteria to propose an approach to analyze the design of current software measures and then design new software measures (illustrated with the design of a software measure that has been adopted as an ISO measurement standard). The book includes several case studies analyzing strengths and weaknesses of some of the software measures most often quoted. It is meant for software quality specialists and process improvement analysts and managers.

Through research, physical oceanography aims to solve the numerous problems stated by thermal, optical and dynamical properties of the oceans. Instrumentation and Metrology in Physical Oceanography describes the means used in oceanography to determine physical properties of the oceans by medium of in situ measurements. This book explores the theoretical functioning of sensors and instruments, as well as different practical aspects of using these tools. The content of this book appeals directly to technicians or engineers wishing to enhance their knowledge of instrumentation and application to environment surveillance. Instrumentation and Metrology in Physical Oceanography details the functioning of sensors and instruments used to assess the following parameters in oceanography: temperature, conductivity, pressure, sound velocity, current in magnitude and direction, time and position with GPS, height of water and tide, waves, optical and chemical properties (turbidity), dissolved gas (O2, CO2), pH, nutrients and other dissolved elements. Furthermore, this book also elaborates on the different means used to obtain measurements at sea (boats, drifting floats, moorings, undersea platforms, gliders…) and techniques currently being developed.

The fabrication of MEMS has been predominately achieved by etching the polysilicon material. However, new materials are in large demands that could overcome the hurdles in fabrication or manufacturing process. Although, an enormous amount of work being accomplished in the area, most of the information is treated as confidential or privileged. It is extremely hard to find the meaningful information for the new or related developments. This book is collection of chapters written by experts in MEMS and NEMS technology. Chapters are contributed on the development of new MEMS and NEMS materials as well as on the properties of these devices. Important properties such as residual stresses and buckling behavior in the devices are discussed as separate chapters. Various models have been included in the chapters that studies the mode and mechanism of failure of the MEMS and NEMS. This book is meant for the graduate students, research scholars and engineers who are involved in the research and developments of advanced MEMS and NEMS for a wide variety of applications. Critical information has been included for the readers that will help them in gaining precise control over dimensional stability, quality, reliability, productivity and maintenance in MEMS and NEMS. No such book is available in the market that addresses the developments and failures in these advanced devices.

The main objective of this book is to present the basic theoretical principles and practical applications for the classical interferometric techniques and the most advanced methods in the field of modern fringe pattern analysis applied to optical metrology. A major novelty of this work is the presentation of a unified theoretical framework based on the Fourier description of phase shifting interferometry using the Frequency Transfer Function (FTF) along with the theory of Stochastic Process for the straightforward analysis and synthesis of phase shifting algorithms with desired properties such as spectral response, detuning and signal-to-noise robustness, harmonic rejection, etc.