Physics and Technology of Crystalline Oxide Semiconductor CAAC-IGZO

This book describes the application of c-axis aligned crystalline In-Ga-Zn oxide (CAAC-IGZO) technology in large-scale integration (LSI) circuits. The applications include Non-volatile Oxide Semiconductor Random Access Memory (NOSRAM), Dynamic Oxide Semiconductor Random Access Memory (DOSRAM), central processing unit (CPU), field-programmable gate array (FPGA), image sensors, and etc. The book also covers the device physics (e.g., off-state characteristics) of the CAAC-IGZO field effect transistors (FETs) and process technology for a hybrid structure of CAAC-IGZO and Si FETs. It explains an extremely low off-state current technology utilized in the LSI circuits, demonstrating reduced power consumption in LSI prototypes fabricated by the hybrid process. A further two books in the series will describe the fundamentals; and the specific application of CAAC-IGZO to LCD and OLED displays. Key features: • Outlines the physics and characteristics of CAAC-IGZO FETs that contribute to favorable operations of LSI devices. • Explains the application of CAAC-IGZO to LSI devices, highlighting attributes including low off-state current, low power consumption, and excellent charge retention. • Describes the NOSRAM, DOSRAM, CPU, FPGA, image sensors, and etc., referring to prototype chips fabricated by a hybrid process of CAAC-IGZO and Si FETs.

This book highlights the display applications of c-axis aligned crystalline indium–gallium–zinc oxide (CAAC-IGZO), a new class of oxide material that challenges the dominance of silicon in the field of thin film semiconductor devices. It is an enabler for displays with high resolution and low power consumption, as well as high-productivity manufacturing. The applications of CAAC-IGZO focus on liquid crystal displays (LCDs) with extremely low power consumption for mobile applications, and high-resolution and flexible organic light-emitting diode (OLED) displays, and present a large number of prototypes developed at the Semiconductor Energy Laboratory. In particular, the description of LCDs includes how CAAC-IGZO enables LCDs with extremely low refresh rate that provides ultra-low power consumption in a wide range of use cases. Moreover, this book also offers the latest data of IGZO. The IGZO has recently achieved a mobility of 65.5 cm2?}V-s, and it is expected to potentially exceed 100 cm2?}V-s as high as that of LTPS. A further two books in the series will describe the fundamentals of CAAC-IGZO, and the application to LSI devices. Key features: • Introduces different oxide semiconductor field-effect transistor designs and their impact on the reliability and performance of LCDs and OLED displays, both in pixel and panel-integrated driving circuits. • Reviews fundamentals and presents device architectures for high-performance and flexible OLED displays, their circuit designs, and oxide semiconductors as an enabling technology. • Explains how oxide semiconductor thin-film transistors drastically can improve resolution and lower power consumption of LCDs.

Key advances in Semiconductor Terahertz (THz) Technology now promises important new applications enabling scientists and engineers to overcome the challenges of accessing the so-called «terahertz gap». This pioneering reference explains the fundamental methods and surveys innovative techniques in the generation, detection and processing of THz waves with solid-state devices, as well as illustrating their potential applications in security and telecommunications, among other fields. With contributions from leading experts, Semiconductor Terahertz Technology: Devices and Systems at Room Temperature Operation comprehensively and systematically covers semiconductor-based room temperature operating sources such as photomixers, THz antennas, radiation concepts and THz propagation as well as room-temperature operating THz detectors. The second part of the book focuses on applications such as the latest photonic and electronic THz systems as well as emerging THz technologies including: whispering gallery resonators, liquid crystals, metamaterials and graphene-based devices. This book will provide support for practicing researchers and professionals and will be an indispensable reference to graduate students in the field of THz technology. Key features: Includes crucial theoretical background sections to photomixers, photoconductive switches and electronic THz generation & detection. Provides an extensive overview of semiconductor-based THz sources and applications. Discusses vital technologies for affordable THz applications. Supports teaching and studying increasingly popular courses on semiconductor THz technology.

An unprecedented look into the basic physics, chemistry, and technology behind the LCD Most notably used for computer screens, televisions, and mobile phones, LCDs (liquid crystal displays) are a pervasive and increasingly indispensable part of our lives. Providing both an historical and a business-minded context, this extensive resource describes the unique scientific and engineering techniques used to create these beautiful, clever, and eminently useful devices. In this book, the history of the science and technology behind the LCD is described in a prelude to the development of the device, presenting a rational development theme and pinpointing innovations. The book begins with Maxwell's theory of electromagnetism, and the ultimately profound realization that light is an electromagnetic wave and an electromagnetic wave is light. The power of mathematical physics thus was brought to bear upon the study of light, and particularly the polarization of light by material bodies, including liquid crystals. After a brief historical description of polarization, a physical interpretation provides substance to the mathematical concepts. Subsequent chapters cover: Thermodynamics for liquid crystals The Maier-Saupe mean field, phenomenological, static continuum, and dynamic continuum theories The transistor and integrated circuit Glass, panels, and modules The calculus of variations The active matrix Semiconductor fabrication The global LCD business Additionally, the book illustrates how mathematics, physics, and chemistry are put to practical use in the LCDs we use every day. By describing the science from an historical perspective and in practical terms in the context of a device very familiar to readers, the book presents an engaging and unique view of the technology for everyone from science students to engineers, product designers, and indeed anyone curious about LCDs. Series Editor: Anthony C. Lowe, The Lambent Consultancy, Braishfield, UK The Society for Information Display (SID) is an international society, which has the aim of encouraging the development of all aspects of the field of information display. Complementary to the aims of the society, the Wiley-SID series is intended to explain the latest developments in information display technology at a professional level. The broad scope of the series addresses all facets of information displays from technical aspects through systems and prototypes to standards and ergonomics.

This collection of fundamental formulae, up-to-date references and definitions in plasma physics is vital to anyone with an interest in plasmas or ionized gases, whether in physics, astronomy or engineering. Both theorists and experimentalists will find this book useful, as it incorporates the latest results and findings, with extended coverage of fusion plasma, plasma in stellar winds, reaction rates, engineering plasma and many other topics. The text is also unique in treating astrophysical plasmas, fusion plasmas, industrial plasmas and low temperature plasmas as aspects of the same discipline.

The development of solid state devices began a little more than a century ago, with the discovery of the electrical conductivity of ionic solids. Today, solid state technologies form the background of the society in which we live. The aim of this book is threefold: to present the background physical chemistry on which the technology of semiconductor devices is based; secondly, to describe specific issues such as the role of defects on the properties of solids, and the crucial influence of surface properties; and ultimately, to look at the physics and chemistry of semiconductor growth processes, both at the bulk and thin-film level, together with some issues relating to the properties of nano-devices. Divided into five chapters, it covers: Thermodynamics of solids, including phases and their properties and structural order Point defects in semiconductors Extended defects in semiconductors and their interactions with point defects and impurities Growth of semiconductor materials Physical chemistry of semiconductor materials processing With applications across all solid state technologies,the book is useful for advanced students and researchers in materials science, physics, chemistry, electrical and electronic engineering. It is also useful for those in the semiconductor industry.

This second edition of a popular textbook is thoroughly revised with around 25% new and updated content. It provides an introduction to both plasma physics and fusion technology at a level that can be understood by advanced undergraduates and graduate students in the physical sciences and related engineering disciplines. As such, the contents cover various plasma confinement concepts, the support technologies needed to confine the plasma, and the designs of ITER as well as future fusion reactors. With end of chapter problems for use in courses.

Serving as a general introduction to surface and interface science, this book focuses on basic concepts rather than specific details, and on intuitive understanding rather than merely learning facts. The text reflects the fact that the physics and chemistry of surfaces is a diverse area of research that involves classical scientific and engineering disciplines. As such, it discusses fundamental subjects, such as thermodynamics of interfaces, as well as applied topics including wetting, friction, and lubrication. Following an introduction to the most important techniques and methods, readers will be able to apply simple models to their own scientific problems. Furthermore, manifold high end technological applications are shown together with the basic scientific treatment, for example AFM, surface technology, biotechnology, microelectronics, and biomaterials. The book is written with advanced students of chemistry, physics, materials science, chemical engineering and related subjects who have a basic knowledge of natural sciences and mathematics in mind. In addition, scientists and engineers who are not yet specialists in surface science but want to learn more about this important subject will equally benefit.

Plasma physics has matured rapidly as a discipline, and now touches on many different research areas, including manufacturing processes. This collection of fundamental formulae and definitions in plasma physics is vital to anyone with an interest in plasmas or ionized gases, whether in physics, astronomy or engineering. Both theorists and experimentalists will find this book useful, as it incorporates the latest results and findings. The text treats astrophysical plasmas, fusion plasmas, industrial plasmas and low temperature plasmas as aspects of the same discipline – a unique approach made possible by the abbreviated nature of a formulary.

A practical guide to semiconductor manufacturing from process control to yield modeling and experimental design Fundamentals of Semiconductor Manufacturing and Process Control covers all issues involved in manufacturing microelectronic devices and circuits, including fabrication sequences, process control, experimental design, process modeling, yield modeling, and CIM/CAM systems. Readers are introduced to both the theory and practice of all basic manufacturing concepts. Following an overview of manufacturing and technology, the text explores process monitoring methods, including those that focus on product wafers and those that focus on the equipment used to produce wafers. Next, the text sets forth some fundamentals of statistics and yield modeling, which set the foundation for a detailed discussion of how statistical process control is used to analyze quality and improve yields. The discussion of statistical experimental design offers readers a powerful approach for systematically varying controllable process conditions and determining their impact on output parameters that measure quality. The authors introduce process modeling concepts, including several advanced process control topics such as run-by-run, supervisory control, and process and equipment diagnosis. Critical coverage includes the following: * Combines process control and semiconductor manufacturing * Unique treatment of system and software technology and management of overall manufacturing systems * Chapters include case studies, sample problems, and suggested exercises * Instructor support includes electronic copies of the figures and an instructor's manual Graduate-level students and industrial practitioners will benefit from the detailed exami?nation of how electronic materials and supplies are converted into finished integrated circuits and electronic products in a high-volume manufacturing environment. An Instructor's Manual presenting detailed solutions to all the problems in the book is available from the Wiley editorial department. An Instructor Support FTP site is also available.